Title of Project : Numerical simulation of 2 D capacitively - coupled RF plasma for the synthesis of silicon nanocrystals
نویسندگان
چکیده
Title of Project: Numerical simulation of 2D capacitively-coupled RF plasma for the synthesis of silicon nanocrystals Name: Romain Le Picard and Carlos Larriba Institution: University of Minnesota Email: [email protected], [email protected] Advisor: Steven L. Girshick Advisor email: [email protected] Institution Visited: University of Michigan Host: Mark J. Kushner Host email: [email protected] Dates of Visit: Start: 11/13/2013 End: 11/15/2013
منابع مشابه
Numerical Modeling of Non-equilibrium Plasma Discharge of Hydrogenated Silicon Nitride (SiH4/NH3/H2)
In this work, we model a radiofrequency discharge of hydrogenated silicon nitride in a capacitive coupled plasma reactor using Maxwellian and non-Maxwellian electron energy distribution function. The purpose is to investigate whether there is a real advantage and a significant contribution using non-Maxwellian electron energy distribution function rather than Maxwellian one for determining the ...
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متن کاملControlled Fluxes of Silicon Nanoparticles to a Substrate in Pulsed Radio-Frequency Argon–Silane Plasmas
It has been hypothesized that high-energy impact of very small silicon nanoparticles on a substrate may lead to epitaxial growth of silicon films at low substrate temperature. A possible means for producing such energetic nanoparticle fluxes involves pulsing an RF silane-containing plasma, and applying a positive DC bias to the substrate during the afterglow phase of each pulse so as to collect...
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Control of the size and material properties of silicon nanoparticles plays a critical role in optimizing applications using those nanoparticles, such as photovoltaics and biomedical devices. While synthesis of silicon nanoparticles in low temperature plasmas has many attractive features, the basic mechanisms leading to formation of nanoparticles in these plasmas are poorly understood. A two-dim...
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تاریخ انتشار 2013